首页> 外文会议>National Conference on Laser Technology and Optoelectronics;Society of Photo-Optical Instrumentation Engineers >Control of Saturable Absorption of Topological Insulator Bi2Se3 by Electron and Hole Doping
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Control of Saturable Absorption of Topological Insulator Bi2Se3 by Electron and Hole Doping

机译:电子和空穴掺杂控制拓扑绝缘子Bi2Se3的饱和吸收

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In this work, few layers of Bi2Se3 is chemically treated, in which the AuCl3 solution is used for oxidation reaction toform p-doping, and BV solution (benzyl dichloride) is put to form n-doping to change material properties. We used pumpprobesystem to verify the effect of doping on Bi2Se3 materials. In addition, the nonlinear saturable absorption of thematerial is also controlled. Through the I-scan test, we found that the saturable absorption has diverse responses todifferent wavelengths and doping conditions. By doping, the Fermi level of the material can be adjusted to control thesaturable absorption of the material, which can be applied to the mode-locked laser. The weakened saturable light intensitycan make the mode-locked pulse easier to generate.
机译:在这项工作中,仅对Bi2Se3的几层进行了化学处理,其中AuCl3溶液用于氧化反应,生成 形成P型掺杂,然后将BV溶液(二氯化苄)制成N型掺杂,以改变材料的性能。我们用pumpprobe 系统以验证掺杂对Bi2Se3材料的影响。另外,非线性饱和吸收 材料也受到控制。通过I扫描测试,我们发现饱和吸收对 不同的波长和掺杂条件。通过掺杂,可以调整材料的费米能级以控制 材料的饱和吸收,可应用于锁模激光器。饱和光强度减弱 可以使锁模脉冲更容易产生。

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