Total contamination control: the minienvironment era

摘要

Semiconductor manufacturers clearly recognize that shrinkinggeometries in semiconductor devices require more stringent process andcontamination control. The application of isolation technology for thereduction and control of particulate contamination levels has moved fromthe development and evaluation stage to its current status as apreferred alternative for new semiconductor manufacturing facilities. Asystem based on Standard Mechanical Interfaces (SMIF), which uses cleanisolation technology to protect the integrity of the wafers duringprocessing, storage and transportation within the facility, isdescribed. An extension of the same principle of isolation, based on theSMIF-technology, enables a selected inert environment to be furnished inthe process tool area as well as in the transport and storagecontainers. The technology enables control of particles, oxygen andwater vapor levels (to the 10 PPM range), organic vapor and gas phasecontaminant. The capabilities of the minienvironment technology and itsbenefits are analyzed