首页> 外文会议>Electronic Components and Technology Conference, 1993. Proceedings., 43rd >Development of transient liquid phase soldering process for LSIdie-bonding
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Development of transient liquid phase soldering process for LSIdie-bonding

机译:LSI的瞬态液相焊接工艺的开发芯片键合

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For high-power semiconductor devices with Cu lead-frames inplastic packages, die-bonding process that can obtain a heat-resistantbond (with high melting point) without large residual stress has beendeveloped by applying transient liquid-phase bonding to the solderingprocess. A three-layered solder sheet the inner layer of which is95Pb-5Sn solder and the surface layers of which are Pb-Sn eutecticsolder is used as the bonding material. The bonding temperature is about460 K so as to melt only eutectic layers. The eutectic layers areisothermally solidified and the melting point of the bond rises to over520 K by a two-hour heat treatment at the bonding temperature. As aresult, a heat-resistant bond can be obtained whose residual stress canbe reduced by more than 1/2 by a low-temperature process
机译:用于带有铜引线框架的大功率半导体器件 塑料封装,可以实现耐热性的压焊工艺 没有很大的残余应力的键合(具有高熔点) 通过将瞬时液相键合应用于焊接而开发 过程。三层焊料片,其内层为 95Pb-5Sn焊料,其表面层为Pb-Sn共晶 焊料用作粘合材料。粘接温度约为 460 K,以便仅熔化共晶层。共晶层是 等温固化,键的熔点升至 在粘合温度下经过两个小时的热处理,达到520K。作为一个 结果,可以获得其残余应力可以达到的耐热粘结。 通过低温工艺减少了超过1/2

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