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Solder joint shape formation under constrained boundaries in waferlevel underfill

机译:晶圆约束边界下的焊点形状形成水平填充

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Standard underfill processing occurs at the package level and isslow since it relies on the capillary flow of the resin. The dispensingoperation requires from 30 to 120 seconds depending on the die geometry,bump pattern, standoff, and material characteristics. Even with the“no-flow” materials introduced recently in the market,processing is still carried out at the unit level. Upon completion ofthe underfill operation, batch curing is done for an additional amountof time. Thus, when multiplied by the number of dies on a wafer, thetotal process time can be quite substantial. Wafer level deposition ofunderfill is the next paradigm shift in flip chip packaging, offeringboth cost savings and higher throughput than with the conventionalprocess. The resin is applied to the wafer and soft-cured prior tosingulation. Final cure of the film is achieved during assembly reflow.A number of challenges do exist in this new process relating to materialformulation and processing. This paper discusses the issue of solderwettability during reflow, while the solder balls are being constrainedby a polymeric underfill layer
机译:标准的底部填充处理发生在包装级别,并且 由于它依赖于树脂的毛细流动,因此速度较慢。点胶 根据模具的几何形状,操作需要30到120秒, 凸起图案,支座和材料特性。即使有 最近在市场上推出的“无流动”材料, 处理仍在单位级别进行。完成后 在底部填充操作中,需要额外进行批量固化 时间。因此,当乘以晶片上的裸片数量时, 总的处理时间可能非常长。晶圆级沉积 底部填充是倒装芯片封装的下一个范式转变,可提供 与传统技术相比,既节省了成本又提高了产量 过程。在将树脂涂覆到晶圆上并进行软固化之前 单一化。膜的最终固化是在组装回流过程中实现的。 在与材料相关的新过程中确实存在许多挑战 配方和加工。本文讨论了焊料的问题 回流焊期间的润湿性,同时限制焊球 通过聚合物底部填充层

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