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Investigation of high reliability micro bump plating technique ontape carrier

机译:高可靠性微凸点电镀工艺研究。载带

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This paper describes the continuous copper bump plating techniquefor TAB tape carriers. We investigated the copper plating bath,pre-treatment agents and the bath agitation method. For high speed anduniform plating, the selection of an appropriate copper plating bath ismost important. Through our investigations, we found the most suitablebath for copper plating bumps, which obtained good appearance and highreliability bumps at 20 A/dm2 or more. The tape carriers withcopper plating bumps were applied to the new stacking board and theburn-in socket substrate for a 0.5 mm pitch BGA package. In both cases,it was confirmed that the tape with bumps had high reliability. Then, acontinuous reel to reel plating machine for TAB tape carrier wasdesigned and manufactured
机译:本文介绍了连续铜凸点电镀技术 用于TAB磁带载体。我们研究了镀铜液, 预处理剂和浴液搅拌方法。对于高速和 镀层均匀,选择合适的镀铜液是 最重要的。通过调查,我们发现最合适的 镀铜凸点用镀液,具有良好的外观和较高的镀层 可靠性达到20 A / dm 2 或更高。带载带 铜凸块已应用于新的堆叠板,并且 用于0.5 mm间距BGA封装的老化插座基板。在这两种情况下 可以确认带凸点的带具有高可靠性。然后, 用于TAB胶带载体的连续式卷对卷电镀机原为 设计制造

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