首页> 外文会议>Electronic Components amp; Technology Conference, 2000. 2000 Proceedings. 50th >Investigation of under bump metallization systems for flip-chipassemblies
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Investigation of under bump metallization systems for flip-chipassemblies

机译:倒装芯片下凸点金属化系统的研究组件

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The objective of this work was to investigate the quality of UnderBump Metallization (UBM) systems used for solder bump flip chipapplications. These three commercial UBM systems were (i)Al/NiV/Cu UBMwith print-and-reflow solder, (ii)Ti-W/Cu UBM with electroplated solderand (iii) Electroless Ni/Au UBM with print-and-reflow solder. The solderwas of an eutectic Sn/Pb composition. UBM quality in terms of thermalstability, corrosion-resistance and thermal-mechanical reliability wereinvestigated using various multiple solder reflow passes, hightemperature storage, pressure cooker test and temperature cycling.Analytical tools such as Scanning Electron Microscopy (SEM),Transmission Electron Microscopy (TEM) and Energy Dispersive X-raySpectrometry (EDS) were used to analyze the metallurgy reactions andfailure modes. This study showed that none of the three systemsinvestigated out-performed the other two in all aspects in the testsconducted
机译:这项工作的目的是调查Under的质量 用于焊料凸块倒装芯片的凸块金属化(UBM)系统 应用程序。这三个商业UBM系统是(i)Al / NiV / Cu UBM 带有印刷和回流焊料,(ii)带有电镀焊料的Ti-W / Cu UBM (iii)具有印刷和回流焊料的化学镍/金UBM。焊锡 具有共晶的Sn / Pb组成。 UBM在热方面的质量 稳定性,耐腐蚀性和热机械可靠性分别为 使用各种多次回流焊进行了调查,高 温度存储,压力锅测试和温度循环。 分析工具,例如扫描电子显微镜(SEM), 透射电子显微镜(TEM)和能量色散X射线 光谱仪(EDS)用于分析冶金反应和 故障模式。这项研究表明,这三个系统都没有 在测试中,被调查者在所有方面的表现均优于其他两个 实施

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