首页> 外文会议>Electrical Insulation and Dielectric Phenomena, 1994. IEEE 1994 Annual Report., Conference on >Polarization and electron injection in silicon nitride induced byprotons
【24h】

Polarization and electron injection in silicon nitride induced byprotons

机译:氮化硅引起的极化和电子注入。质子

获取原文

摘要

The Kohlrausch behaviour of the polarization currentsj=At-α, which is found in many disordered insulators,has been detected in thin films of silicon nitride also. The materialcontains a small amount of hydrogen due to the growth process. Using apalladium electrode it was possible to incorporate additional hydrogenions, i.e. protons. This results in an increase of A in the aboveformula by a factor 10. Furthermore it is found that electron injectionis enhanced by the presence of additional protons
机译:极化电流的Kohlrausch行为 j = At ,在许多无序绝缘子中都发现, 还已经在氮化硅薄膜中检测到了。该材料 由于生长过程中含有少量的氢。用一个 钯电极可以掺入额外的氢 离子,即质子这导致上述A的增加 公式乘以10。此外,发现电子注入 附加质子的存在会增强

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号