Real-time amine monitoring and its correlation to critical dimension control of chemically amplified resists for sub-0.25-um geometries

摘要

Abstract: One such issue is the quantitative control of critical dimension (CD) and how to calibrate fab contamination levels to linewidth control. Since most fabs build several generations of devices, contamination levels for older generations may not be suitable for new generations. Therefore, studies to control CD for each generation are required to determine the effectiveness of filtration schemes. In this paper the authors have investigated CD control for imaging dimensions from 0.25 $mu@m to 0.15 $mu@m. We have also correlated this data back to chemical monitoring levels to determine CD vs. PED stability for these geometry's to determine the contamination level tolerance. Additionally, the authors have generated process windows to determine the effect such delays have on process windows.!5