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The effect of oxygen impurities on radiation hardness of FZ silicon detectors for HEP after neutron, proton and gamma irradiation

机译:氧气杂质对中子,质子和γ辐射后HEP硅探测器辐射硬度的影响

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Radiation hardness for fast neutrons, high energy protons and ~(60)Co gamma rays of planar detectors processed from highly oxygenated silicon detectors obtained by using the high temperature (1200°C), long time (> 200 hours) oxidation technology, are compared with standard silicon detectors. For fast neutron irradiation it is found that there is no advantage of using highly oxygenated silicon FZ detectors as compared to the standard ones in terms of full depletion voltage degradation as measured a few days after radiation. For a gamma ray dose of 250 Mrad, the standard detectors of all resistivities (1 kΩcm to 5.6 kΩcm) invert the space charge sign, while there is little change in space charge density for oxygenated ones. For proton irradiation, the rate in full depletion voltage increase (β) of oxygenated detectors is 2.3 times less than that of standard detectors. The difference in radiation hardness is explained in terms of effect of radiation induced disorder regions (clusters of vacancies) on the introduction rates of divacancies in the oxygenated silicon.
机译:快速中子的辐射硬度,高能量质子和〜(60)与通过使用高温(1200℃),长时间(> 200小时)氧化技术获得的高氧化硅探测器加工的平面探测器的高能质子和〜(60)CO伽马射线用标准硅探测器。对于快节中子辐射,发现与标准耗尽电压劣化相比,在辐射后几天测量,没有使用高氧化硅FZ探测器的优点。对于250 mrad的伽马射线剂量,所有电阻的标准探测器(1kΩcm至5.6kΩcm)反转空间电荷标志,而氧化含量很小。对于质子辐射,含氧探测器的全耗尽电压增加(β)的速率比标准探测器的全耗尽电压增加(β)增加2.3倍。在辐射硬度差在对含氧硅双空位的导入率辐射诱导的紊乱的区域(空位簇)的效果的观点进行说明。

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