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DDR as KGD in 3D-IC M1 Short Failure Analysis

机译:DDR为3D-IC M1短故障分析的KGD

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摘要

3D-IC is becoming more popular in recently years due to the advantages of lower cost and area saving [1]. A simple 3D chip is represented by stacking 2 dies which comprise of with a SOC (System on chip) die and a KGD (Known good die) memory die (DDR) in a single package chip. Although the architecture appears to be straightforward, failure analysis is significantly more challenging than a single die packaged chip [2]. This paper provides a systematic methodology for the failure debug on such a dual-die co-packaged chip. Based on board level electrical analysis and SAT/ 3D-Xay detection, a SOC die problem and interconnection problem can be excluded. The suspected DDR die can be taken out from the 3D-IC to be repackaged to a DDR chip. By testing this chip, memory register failures can be diagnosed. In the case study presented, Cu residues has been found between long routing M1line with min space at peripheral area after delayering PFA. A single wafer DHF clean step after M1 etch is introduced as a corrective fix to eliminate this residue. After this process optimization, Cu residues are proven to be removed and the 3D-IC chip passes the following reliability qualification.
机译:由于成本较低和区域节省的优势,3D-IC在近年来正在变得更加流行[1]。通过堆叠2个模具表示简单的3D芯片,该模具包括在单个封装芯片中包含SOC(芯片上的SOM)和KGD(已知的好模具)存储器管芯(DDR)。虽然该架构似乎是直截了当的,但故障分析比单芯片封装芯片显着挑战更具挑战性[2]。本文为这种双芯片共同包装芯片上的故障调试提供了一种系统方法。基于板级电气分析和SAT / 3D-Xay检测,可以排除SOC模具问题和互连问题。可疑的DDR DIA可以从3D-IC中取出以重新包装到DDR芯片。通过测试此芯片,可以诊断存储器寄存器故障。在提出的情况下,在延迟PFA之后的周边区域的长路由M1Line之间已经发现Cu残留物。将M1蚀刻后的单个晶片DHF清洁步骤作为矫正固定以消除该残余物。在该过程优化之后,证明CU残基被证明是要拆除,3D-IC芯片通过以下可靠性资格。

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