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Failure analysis on corrosion induced Cu-Al bond failures

机译:腐蚀诱导Cu-Al债券失败的失败分析

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The failure analysis from the manufacturer could not fully explain the Cu-Al bond open and drift issues in some plastic encapsulated microcircuits. For further investigation, an insight analysis containing chemical deprocessing, cross-sectioning and mechanical opening was performed to define the root cause. Several new findings were observed to support a reasonable cause. The corrosion reaction of intermetallic compounds (IMC) with Cl ions participating was responsible for the anodic bond open failures, cracks grew at the interfaces of Cu ball and IMC, and the re-deposition of Cu ball corrosion resulted in leakage current and drift faults. The results prove that Cu-Al bond is sensitive to H2O and Cl, which play a role as catalysis, and the corrosion tend to happen more easily in anode with bias.
机译:制造商的故障分析无法完全解释一些塑料封装的微电路中的Cu-Al键开放和漂移问题。为了进一步调查,进行了含有化学伪造,横截面和机械开口的洞察分析以确定根本原因。观察了几种新发现以支持合理的原因。金属间化合物(IMC)与CL离子参与的腐蚀反应负责阳极键打开故障,Cu球和IMC的界面裂缝增长,并且Cu球腐蚀的再沉积导致漏电流和漂移故障。结果证明了Cu-Al键对H 2 O和Cl的敏感,其在催化作用中起作用,并且腐蚀倾向于在具有偏压的阳极中更容易发生。

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