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Failure analysis on corrosion induced Cu-Al bond failures

机译:腐蚀引起的Cu-Al键失效的失效分析

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The failure analysis from the manufacturer could not fully explain the Cu-Al bond open and drift issues in some plastic encapsulated microcircuits. For further investigation, an insight analysis containing chemical deprocessing, cross-sectioning and mechanical opening was performed to define the root cause. Several new findings were observed to support a reasonable cause. The corrosion reaction of intermetallic compounds (IMC) with Cl ions participating was responsible for the anodic bond open failures, cracks grew at the interfaces of Cu ball and IMC, and the re-deposition of Cu ball corrosion resulted in leakage current and drift faults. The results prove that Cu-Al bond is sensitive to H2O and Cl, which play a role as catalysis, and the corrosion tend to happen more easily in anode with bias.
机译:制造商的故障分析无法完全解释某些塑料封装微电路中的Cu-Al键打开和漂移问题。为了进行进一步的研究,进行了包含化学处理,横截面和机械开口的洞察分析,以确定根本原因。观察到一些新发现支持合理的原因。金属间化合物(IMC)参与Cl离子的腐蚀反应是造成阳极键断开的原因,Cu球与IMC的界面处出现裂纹,Cu球腐蚀的再沉积导致漏电流和漂移故障。结果表明,Cu-Al键对H2O和Cl敏感,它们起催化作用,在带有偏压的阳极中腐蚀更容易发生。

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