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Improvement of Thermal Endurance for Integrated Millimeter-Wave Silicon IMPATT Device in µm2-Scale

机译:微米级集成毫米波集成硅IMPATT器件的耐热性改进

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Based on the fact that the avalanche frequency of impact-ionization avalanche transit-time (IMPATT) diode is proportional to the square-root of DC biasing current density, more DC current injection is necessary to push the negative differential resistances (NDRs) into higher frequency regime. This leads to a serious thermal endurance problem for IMPATT devices in monolithic integration scenario, since the pn-junction area reaches only µm2-scale compared to traditional discrete cases of mm2-scale and on the other side there is lack of huge heat sink commonly applied in each discrete IMPATT component design. After characterizing series of fabricated IMPATT devices with pn-junction area of 30 × 2 µm2; 30 × 4 µm2; 30 × 6 µm2; 30 × 10 µm2, their avalanche frequencies haven been extracted and plotted over varied square-root of DC biasing current densities. The discrepancy between the estimated and measured profiles has confirmed and explained exactly the usually ignored temperature effect. Scanning electron microscopy (SEM) images have been taken for a burned out IMPATT diode of 30 × 2 µm2. The weak point did not occur at the expected “fragile” pn-junction, but at the metallic interconnect. This triggered an improvement of a new device layout design. The SEM images of two IMPATT diodes with the same pn-junction (30 × 2 µm2) but different layouts in the burn-out test verifies the improvement of device thermal endurance. Additionally, the IMp ATT diode with the new layout design offered 7 mA more regarding the maximum injected DC biasing current than the one with old layout design. This ensures the overall device robustness regarding thermal endurance for further circuit design.
机译:基于冲击电离雪崩渡越时间(IMPATT)二极管的雪崩频率与直流偏置电流密度的平方根成正比这一事实,必须注入更多的直流电流才能将负微分电阻(NDR)推高。频率体制。在单片集成情况下,这会导致IMPATT器件出现严重的热耐久性问题,因为pn结面积仅达到µm 2 与传统的2毫米离散情况相比,在另一种离散IMPATT组件设计中通常没有巨大的散热器。在表征了一系列制造的具有30×2 µm pn结的IMPATT器件后 2 ; 30×4微米 2 ; 30×6微米 2 ; 30×10 µm2的雪崩频率尚未提取出来,并绘制在直流偏置电流密度的不同平方根上。估计曲线和测量曲线之间的差异已经确认并准确解释了通常忽略的温度效应。已为30×2 µm2的烧坏的IMPATT二极管拍摄了扫描电子显微镜(SEM)图像。弱点并未出现在预期的“易碎” pn结处,而是出现在金属互连处。这引发了对新设备布局设计的改进。两个具有相同pn结(30×2 µm)的IMPATT二极管的SEM图像 2 ),但烧坏测试中的布局不同可以验证器件的耐热性。此外,采用新布局设计的IMp ATT二极管提供的最大注入直流偏置电流比采用旧布局设计的IMp ATT二极管多​​7 mA。这确保了器件在热耐久性方面的整体鲁棒性,可用于进一步的电路设计。

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