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Physics of Degradation in SiC MOSFETs Stressed by Overvoltage and Overcurrent Switching

机译:过压和过流开关在SiC MOSFET中造成的退化物理学

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This work presents the ruggedness of SiC power MOSFETs outside the safe-operating-area (SOA) conditions based on a hard-switching cycling test. The device was stressed to withstand overvoltage and overcurrent beyond their voltage and current ratings in each switching cycle. This switching cycling test was performed at an ambient temperature of 25 oC and 100 oC. Two independent degradations, one at the gate-oxide and the other at the semiconductor junction region, were observed. The second degradation has not been previously reported in the literature. Both degradations were found to accelerate at the high ambient temperature. The physics of these two device degradations were unveiled: the hot-electron induced gate-oxide degradation accounts for the first device degradation; the electron hopping through the defect states created in the stress tests accounts for the second device degradation.
机译:基于硬开关循环测试,这项工作提出了在安全工作区域(SOA)条件之外的SiC功率MOSFET的坚固性。在每个开关周期中,该器件都承受超过其额定电压和电流的过电压和过电流。在环境温度为25的条件下执行此切换循环测试 o C和100 o C.观察到两个独立的退化,一个在栅氧化物上,另一个在半导体结区。先前在文献中没有报道第二次降解。发现两种降解在高环境温度下均加速。揭示了这两种器件退化的物理原理:热电子诱导的栅氧化物退化是第一个器件退化的原因。在应力测试中产生的通过缺陷状态的电子跳跃是造成第二次器件性能下降的原因。

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