Exposure System Improvement for Greater Productivity

摘要

Minimization of downtime is an important requirement for maximizing customer profits in electronic device manufacturing, in addition to increased superposition accuracy and resolution performance, as well as increased processing speed. This paper reports on efforts for maximization of practical production volume and maximization of uptime in semiconductor exposure equipment of Canon. In order to minimize downtime, a monitoring system is being constructed which monitors the operating state of the exposure equipment and also utilizes the latest technologies such as machine learning. The latest development status of this system is also reported.