The optical damage threshold of 3D nanolithography produced microstructures under intense femtosecond irradiation

摘要

This work is dedicated for statistical investigation of laser induced damage threshold of a 3D fs laser lithography produced objects. Arrays of identical polymeric structures are produced out of different materials common in 3D printing and lithography and subjected to varying laser fluence resulting in polymeric objects either being damaged or not. Then, according to the damage probability, linear approximation is used to determine laser induced damage threshold in such structures. This way it is determined, that non photosensitized hybrid organic-inorganic zirconium containing SZ2080 is the most resilient material in comparison to photosensitized SZ2080, other hybrid photopolymer OrmoClear, popular in lithography SU8 and Ember Clear used in 3D printing. Acquired results are compared to those obtained by other measurement techniques, advantages and drawbacks of such investigation are discussed.