Control rule of metrology tool alignment for semiconductor cross FABs

摘要

In response to the development in semiconductors, global semiconductor factories generally have cross-regional and cross-border Multi-Fab trends and needs; and with the needs of “new product types”, “next generation products” and “new customers”, consistent measurements must be developed. Cross-plant measurement machine consistency management mechanisms and methods should maintain cross-plant baseline to ensure product and production capacity's flexibility and fast deployment, to achieve an open semiconductor foundry.