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A 14.3pW Sub-Threshold 2T Gain-Cell eDRAM for Ultra-Low Power IoT Applications in 28nm FD-SOI

机译:适用于28nm FD-SOI中超低功耗IoT应用的14.3pW亚阈值2T增益单元eDRAM

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Internet of Things (IoT) applications, such as biomedical sensing, often require on-chip embedded memories, which dominate both the silicon area and power of these applications [1, 2]. To adhere to the ultra-low power (ULP) requirements of IoT applications, supply voltage (VDD) scaling down to the sub-threshold voltage (VT) region can be used to significantly reduce both the static and dynamic power consumption of these applications. However, embedded memories, typically implemented with 6T SRAM macros, suffer from decreased noise margins and become unreliable at near VT supply voltages [2-4].
机译:诸如生物医学传感之类的物联网(IoT)应用程序通常需要片上嵌入式存储器,它们在这些应用程序的硅片面积和功率上均占主导地位[1、2]。为了满足物联网应用的超低功耗(ULP)要求,电源电压(V DD )缩小至亚阈值电压(V T )区域可用于显着降低这些应用程序的静态和动态功耗。但是,通常用6T SRAM宏实现的嵌入式存储器的噪声容限降低,并且在接近V的电压下变得不可靠 T 电源电压[2-4]。

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