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Benchmarks of a III-V TFET technology platform against the 10-nm CMOS technology node considering 28T Full-Adders

机译:考虑28T全加入器的10nm CMOS技术节点III-V TFET技术平台的基准

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This paper presents a benchmark of a virtual III-V TFET nanowire technology platform against the predictive models of CMOS FinFETs for the 10-nm technology node. The standard 28T full adder and the 32-bits ripple carry adder are used as vehicle circuit/architecture for the comparison, respectively. Figures-of-merit including delays, energy and energy-delay plots are discussed.
机译:本文介绍了虚拟III-V TFET纳米线技术平台的基准,针对10nm技术节点的CMOS FinFET的预测模型。标准28T完整加法器和32位纹波携带加法器分别用作用于比较的车辆电路/架构。讨论了包括延迟,能量和能量延迟图的优点。

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