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Single pulse short-circuit robustness and repetitive stress aging of GaN GITs

机译:GaN GIT的单脉冲短路鲁棒性和重复应力老化

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Short-circuit withstand capability is a key requirement for semiconductor power devices in a number of strategic application domains, including traction, renewable energies and power distribution. Indeed, though clearly a non-intentional operational mode, sort-circuit can be nonetheless a relatively frequent event. Due to its associated considerable electro-thermal stress levels, a thorough analysis of both single pulse withstand capability and device aging as a result of repetitive stress are mandatory before widespread deployment of new device technologies. In this paper, the focus is on latest generation commercial gate-injection GaN transistors, in the 600 V rating class. Extensive experimental analysis is presented, putting forward an interpretation of the underlying degradation and failure mechanisms, supported by coupled electro-thermal device models, incorporating both the functional and structural characteristics of the devices. The findings highlight a remarkable robustness of a specific type of p-gate GaN HEMTs, referred to as gate injection transistors (GITs), against short-circuit stress, making them a potentially very attractive and competitive technology in the voltage class of relevance.
机译:短路承受能力是许多战略应用领域(包括牵引力,可再生能源和配电)中半导体功率器件的关键要求。确实,尽管显然是非故意的操作模式,但排序电路仍可能是相对频繁的事件。由于其相关的相当大的电热应力水平,因此在广泛使用新的器件技术之前,必须对单脉冲承受能力和由于重复应力而导致的器件老化进行彻底的分析。在本文中,重点是额定电压为600 V的最新一代商用栅极注入GaN晶体管。提出了广泛的实验分析,提出了对潜在的退化和故障机理的解释,并结合了电热装置的模型,结合了装置的功能和结构特征。这些发现凸显了特定类型的p栅极GaN HEMT(称为栅极注入晶体管(GIT))在抵抗短路应力方面的出色鲁棒性,使其成为相关电压类别中潜在的非常有吸引力且具有竞争力的技术。

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