首页> 外文会议>Conference on metrology, inspection, and process control for microlithography XXXI >A hybrid solution using computational prediction and measured data to accurately determine process corrections with reduced overlay sampling
【24h】

A hybrid solution using computational prediction and measured data to accurately determine process corrections with reduced overlay sampling

机译:使用计算预测和测量数据的混合解决方案,以减少重叠采样的方式准确确定过程校正

获取原文

摘要

Reducing overlay error via an accurate APC feedback system is one of the main challenges in high volume production of the current and future nodes in the semiconductor industry. The overlay feedback system directly affects the number of dies meeting overlay specification and the number of layers requiring dedicated exposure tools through the fabrication flow. Increasing the former number and reducing the latter number is beneficial for the overall efficiency and yield of the fabrication process. An overlay feedback system requires accurate determination of the overlay error, or fingerprint, on exposed wafers in order to determine corrections to be automatically and dynamically applied to the exposure of future wafers. Since current and future nodes require correction per exposure (CPE), the resolution of the overlay fingerprint must be high enough to accommodate CPE in the overlay feedback system, or overlay control module (OCM). Determining a high resolution fingerprint from measured data requires extremely dense overlay sampling that takes a significant amount of measurement time. For static corrections this is acceptable, but in an automated dynamic correction system this method creates extreme bottlenecks for the throughput of said system as new lots have to wait until the previous lot is measured. One solution is using a less dense overlay sampling scheme and employing computationally up-sampled data to a dense fingerprint. That method uses a global fingerprint model over the entire wafer; measured localized overlay errors are therefore not always represented in its up-sampled output. This paper will discuss a hybrid system shown in Fig. 1 that combines a computationally up-sampled fingerprint with the measured data to more accurately capture the actual fingerprint, including local overlay errors. Such a hybrid system is shown to result in reduced modelled residuals while determining the fingerprint, and better on-product overlay performance.
机译:通过精确的APC反馈系统减少重叠误差是半导体行业当前和未来节点的批量生产中的主要挑战之一。覆盖层反馈系统会直接影响满足覆盖层规格的裸片数量以及整个制造流程中需要专用曝光工具的层数。增加前者的数量并减少后者的数量有利于制造工艺的整体效率和良率。覆盖反馈系统需要精确确定暴露的晶片上的覆盖误差或指纹,以便确定要自动动态地应用于未来晶片的暴露的校正。由于当前和将来的节点都需要每次曝光校正(CPE),因此覆盖指纹的分辨率必须足够高,以将CPE容纳在覆盖反馈系统或覆盖控制模块(OCM)中。从测量的数据中确定高分辨率的指纹需要非常密集的覆盖采样,这需要大量的测量时间。对于静态校正,这是可以接受的,但是在自动动态校正系统中,该方法为所述系统的吞吐量产生了极大的瓶颈,因为新批次必须等待直到之前的批次被测量。一种解决方案是使用密度较小的覆盖采样方案,并将计算上采样的数据应用于密度较高的指纹。该方法在整个晶圆上使用了全局指纹模型。因此,测量的局部覆盖误差​​并不总是在其上采样输出中表示。本文将讨论图1所示的混合系统,该系统将计算上采样的指纹与测量数据相结合,以更准确地捕获包括局部覆盖误差​​在内的实际指纹。示出了这种混合系统在确定指纹的同时减少了建模残差,并且具有更好的产品覆盖性能。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号