首页> 外文会议>Conference on Applied Optics and Photonics China >Preliminary Study of the influence of polarization orientation on bulk damage resistances of doubler KDP crystals
【24h】

Preliminary Study of the influence of polarization orientation on bulk damage resistances of doubler KDP crystals

机译:极化取向对倍增KDP晶体体电阻抗的影响的初步研究

获取原文
获取外文期刊封面目录资料

摘要

The investigation of the influence polarization orientation on damage performance of type I doubler KDP crystals grown by the conventional growth method under under 532nm pulse exposure is carried out in this work. The obtained results point out the pinpoint density (ppd) of polarization parallels the extraordinary axis is around 1.5x less than that of polarization parallels the ordinary axis under the same fluence, although polarization has no influence on size distribution of pinpoints. Meanwhile, crystal inhomogeneity is observed during experiment.
机译:在这项工作中,研究了偏振取向对通过常规生长方法在532nm脉冲曝光下生长的I型倍增KDP晶体的损伤性能的影响。所得结果指出,在相同的通量下,平行于寻常轴的极化的针点密度(ppd)比平行于寻常轴的极化的针点密度(ppd)小约1.5倍,尽管极化对针点的大小分布没有影响。同时,在实验过程中观察到晶体不均匀性。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号