Localization of Dark Current Random Telegraph Signal sources in pinned photodiode CMOS Image Sensors

摘要

This work presents an analysis of Dark Current Random Telegraph Signal (DC-RTS) in CMOS Image Sensors (CIS). The objective is to provide new insight on RTS in modern CIS by determining the localization of DC-RTS centers and the oxide interfaces involved. It is shown that DC-RTS centers are located near the transfer gate. In particular, it is demonstrated that both gate oxide and Shallow Trench Isolation (STI) contribute to this parasitic dark current variation.