A simple way to grow large-area single-layer MoS2 film by chemical vapor deposition

摘要

We demonstrate a simple way to grow continuous and single-layer MoS film by LPCVD (Low Pressure Chemical Vapor Deposition) in centimeter scale. The as-grown MoS films are characterized by optical microscopy (OM), scanning electron microscopy (SEM), Raman spectroscopy, photoluminescence (PL) spectroscopy, atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS). The layer number of MoS can be controlled by changing the amount of MoO and S.