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PBTI and PBTS testing of 0.25 μm pMOSFET devices for analog circuits

机译:适用于模拟电路的0.25μmpMOSFET器件的PBTI和PBTS测试

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Parametric device shifts occur in a 0.25 μm CMOS sense amp circuit during a High Temperature Operation Life (HTOL) test, due to the positive bias stress on the pMOSFET devices. The positive gate bias from the HTOL stress causes a larger negative shift in the threshold voltage of the 5V pMOSFET devices and a mismatch in the transconductance of the differential pair, resulting in a decrease in the gain of the amplifier. Negative shifts in threshold voltage are also observed for 5V pMOSFET test structures for devices with no protect diodes (antenna ratio = 1000:1) after either Positive Bias Temperature Instability (PBTI) tests or Positive Bias Temperature Stress (PBTS). The PBTI and PBTS are caused by positive charge from interface states and bulk oxide traps.
机译:由于pMOSFET器件上的正偏置应力,在高温工作寿命(HTOL)测试期间,参数器件发生在0.25μmCMOS感测放大器电路中。来自HTOL应力的正栅极偏置会导致5V pMOSFET器件的阈值电压出现较大的负偏移,并导致差分对的跨导不匹配,从而导致放大器增益降低。在正偏置温度不稳定性(PBTI)测试或正偏置温度应力(PBTS)测试之后,对于没有保护二极管(天线比= 1000:1)的器件,在5V pMOSFET测试结构中也观察到阈值电压出现负移。 PBTI和PBTS是由界面态和体氧化物陷阱产生的正电荷引起的。

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