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Solder ball joint reliability with electroless Ni/Pd/Au plating -influence of electroless Pd deposition reaction process and electroless Pd film thickness

机译:化学镀Ni / Pd / Au的焊球接头可靠性-化学镀Pd反应过程和化学镀Pd膜厚度的影响

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On the solder ball joint reliability, the influence of electroless Pd deposition reaction process and Pd film thickness in electroless Ni/Pd/Au plating was examined. The solder ball joint reliability was evaluated by a high-speed solder ball shear test. Sn-3.0Ag-0.5Cu (SAC305) was used as the solder ball in this study. In the electroless Pd deposition on the electroless Ni film, deposition reaction processes involve replacement reaction and following reduction reaction. We considered that the solder joint reliability was influenced by Pd replacement reaction time and was excellent when replacement reaction time was short. On the basis of the solder joint reliability obtained after multiple reflow cycles and thermal aging, the optimum thickness of the Pd film was found to be 0.05-0.2 μm. The covering property of electroless Pd plating film on the electroless Ni plating film was also investigated. We found that an electroless Pd plating film with a thickness of 0.02 μm or more covered the electroless Ni plating film adequately, and the solder ball joint reliability in this case was better than that with electroless Ni/Au plating. We consider that the shape of the intermetallic compounds (IMCs) is one of the factors that influence the solder joint reliability after multiple reflow cycles. Consequently, we inferred that the high adhesion at the dendrite layers of IMCs/solder interface resulted in excellent solder ball joint reliability after the reflow cycles. We consider that the thickness of the IMCs is one of the factors that influence the solder joint reliability after thermal aging. In (Cu, Ni, Pd)6Sn5 IMCs that contained trace amounts of Pd, the growth of the IMCs is prevented by Pd, resulting in excellent solder ball joint reliability after thermal aging.
机译:关于焊料球接头的可靠性,研究了化学镀Ni / Pd / Au中化学镀Pd反应过程和Pd膜厚度的影响。焊球接头的可靠性通过高速焊球剪切测试进行评估。本研究中使用Sn-3.0Ag-0.5Cu(SAC305)作为焊球。在化学镀Ni膜上的化学镀Pd中,沉积反应过程包括置换反应和随后的还原反应。我们认为,焊点的可靠性受Pd置换反应时间的影响,在置换反应时间短的情况下极好。基于在多次回流循环和热老化之后获得的焊点可靠性,发现Pd膜的最佳厚度为0.05-0.2μm。还研究了化学镀Ni膜上的化学镀钯膜的覆盖性。我们发现,厚度为0.02μm或更大的化学镀Pd膜可以充分覆盖化学镀Ni膜,并且在这种情况下的焊球接合可靠性要优于化学镀Ni / Au镀层。我们认为金属间化合物(IMC)的形状是影响多次回流循环后焊点可靠性的因素之一。因此,我们推断,在IMC /焊料界面的枝晶层上的高附着力导致回流循环后出色的焊球接合可靠性。我们认为IMC的厚度是影响热老化后焊点可靠性的因素之一。在包含痕量Pd的(Cu,Ni,Pd)6Sn5 IMC中,Pd阻止了IMC的生长,从而在热老化后具有出色的焊球接合可靠性。

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