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Atomic Layer Deposited (ALD) coatings for future astronomical telescopes: recent developments.

机译:用于未来天文望远镜的原子层沉积(ALD)涂层:最新进展。

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Atomic Layer Deposition (ALD) can create conformal, near stoichiometric and pinhole free transmissive metal fluoride coatings to protect reflective aluminum films. Spectral performance of astronomical mirror coatings strongly affect the science capabilities of astronomical satellite missions. We are utilizing ALD to create a transmissive overcoat to protect aluminum film mirrors from oxidation with the goal of achieving high reflectance (> 80%) from the UV (~100 nm) to the IR (~2,000 ran). This paper summarizes the recent developments of ALD aluminum fluoride (A1F_3) coatings on Al. Reflectance measurements of aluminum mirrors protected by ALD A1F_3 and future applications are discussed. These measurements demonstrate that Al + ALD A1F_3, even with an interfacial oxide layer of a few nanometers, can provide higher reflectance than Al protected by traditional physical vapor deposited MgF_2 without an oxide layer, below ~115 nm.
机译:原子层沉积(ALD)可以产生保形,接近化学计量且无针孔的透射性金属氟化物涂层,以保护反射铝膜。天文镜面涂层的光谱性能极大地影响了天文卫星任务的科学能力。我们正在利用ALD来创建一种透射保护层,以保护铝膜镜免受氧化,目的是实现从紫外线(〜100 nm)到红外线(〜2,000 ran)的高反射率(> 80%)。本文总结了Al上ALD氟化铝(AlF_3)涂层的最新发展。讨论了由ALD A1F_3保护的铝镜的反射率测量及其未来应用。这些测量结果表明,即使具有几纳米的界面氧化物层,Al + ALD AlF_3仍可提供比受传统物理气相沉积MgF_2的无氧化物层保护的Al更高的反射率,低于〜115 nm。

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