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Numerical simulation of temperature field and thermal stress field in silicon-based positive-intrinsic-negative photodiode irradiated by multipulsed millisecond laser

机译:多脉冲毫秒激光辐照硅基本征-负光电二极管温度场和热应力场的数值模拟

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Laser induced morphological damage have been observed in silicon-based positive-intrinsic-negative photodiode. This paper adopted the methods of the theoretical calculation and finite element numerical simulation to model, then solved the temperature field and thermal stress field in silicon-based positive-intrinsic-negative photodiode irradiated by multipulsed millisecond laser, and researched the features and laws of the temperature field and thermal stress field. As for the thermal-mechanical problem of multipulsed millisecond laser irradiating silicon-based positive-intrinsic-negative photodiode,based on Fourier heat conduction and thermoelasticity theories, we established a two-dimensional axisymmetric mathematical model .Then adopted finite element method to simulate the transient temperature field and thermal stress field. The temperature dependences of the material parameters and the absorption coefficient were taken into account in the calculation.The results indicated that there was the heat accumulation effect when multipulsed millisecond laser irradiating silicon-based positive-intrinsic-negative photodiode. The morphological damage threshold were obtained numerically. The evolution of temperature at the central point of the top surface, the temperature distribution along the radial direction in the end of laser irradiation and the temperature distribution along the axial direction in the end of laser irradiation were considered. Meanwhile, the radial stress, hoop stress, axial stress on the top surface and the R=500μm axis were also considered. The results showed that the morphological damage threshold decreased with the increased of the pulse number. The results of this study have reference significance of researching the thermal and thermal stress effect evolution's features when multipulsed millisecond laser irradiating silicon-based positive-intrinsic-negative photodiode, then revealing the mechanism of interactions between millisecond laser and photodiode.
机译:在基于硅的正-本征-负光电二极管中观察到了激光诱导的形态损伤。本文采用理论计算和有限元数值模拟的方法进行建模,然后求解多脉冲毫秒激光辐照的硅基本征-负光电二极管的温度场和热应力场,并研究了其特性和规律。温度场和热应力场。针对多脉冲毫秒激光辐照硅基正本征-负光电二极管的热机械问题,基于傅立叶热导和热弹性理论,建立了二维轴对称数学模型,然后采用有限元方法对瞬态进行了模拟。温度场和热应力场。计算中考虑了材料参数与吸收系数的温度相关性。结果表明,多脉冲毫秒激光辐照硅基正本征-负光电二极管具有蓄热效应。数值获得了形态损伤阈值。考虑了在顶表面的中心点处的温度的变化,在激光照射结束时沿径向的温度分布以及在激光照射结束时沿轴向的温度分布。同时,还考虑了顶面上的径向应力,环向应力,轴向应力以及R =500μm轴。结果表明,随着脉冲数的增加,形态破坏阈值逐渐降低。本研究结果对研究多脉冲毫秒激光辐照硅基正本征负光电二极管时的热和热应力效应演化特征具有参考意义,并揭示了毫秒激光与光电二极管相互作用的机理。

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