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Impact of BCP Asymmetry on DSA Patterning Performance

机译:BCP不对称对DSA图案化性能的影响

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Directed self-assembly (DSA) of lamellae-forming block copolymers (BCP) via chemo-epitaxy is a potential lithographic solution to achieve patterns of dense features. Progress to date demonstrates encouraging results, but in order to better understand the role of all parameters, systematic analysis of each factor needs to be assessed. Small changes in the volume fraction of a lamellae-forming BCP have been shown to change the connectivity of unguided domains. When an asymmetric lamellae-forming BCP is assembled on chemical patterns generated with the LiNe flow, the patterning performance and defect modes change depending on whether the majority or minority volume fraction phase is guided by the chemical pattern. Asymmetric BCP formulations were generated by blending homopolymer with a symmetric BCP. The patterning performance of the BCP formulations was assessed for different pattern pitches, guide stripe widths, backfill materials and annealing times. Optical defect inspection and SEM review are used to track the majority defect mode for each formulation. Formulation-dependent trends in defect modes show the importance of optimizing the BCP formulation in order to minimize the defectivity.
机译:通过化学外延的薄片形成嵌段共聚物(BCP)的定向自组装(BCP)是潜在的光刻溶液,以实现致密特征的图案。迄今为止的进展表明令人鼓舞的结果,但为了更好地了解所有参数的作用,需要评估每个因素的系统分析。已经显示了薄片形成BCP的体积分数的小变化来改变无导体结构域的连通性。当在用线流产生的化学图案上组装不对称的薄片形成BCP时,图案化性能和缺陷模式根据化学模式指导大多数或少数体积分数阶段而变化。通过将均聚物与对称BCP混合而产生不对称BCP制剂。为不同的图案间距,引导条纹宽度,回填材料和退火时间评估BCP配方的图案化性能。光学缺陷检查和SEM审查用于跟踪每个配方的多数缺陷模式。缺陷模式的配方依赖性趋势表明,优化BCP配方的重要性,以最大限度地减少缺陷。

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