Performance Analysis of AsF5-intercalated Top-Contact Multi Layer Graphene NanoRibbon Interconnects

摘要

In this paper, As F5-intercalated multilayer graphene nanoribbons (MLGNRs) as a potential interconnect candidate for future technology nodes is investigated. This paper for the first time analyzes impact of As F5 intercalation on effective resistance of top contact MLGNR (TC-MLGNRs) interconnects. Performance metrics such as delay, energy delay product and bandwidth density of As F5-intercalated TC-MLGNRs for local/intermediate and global interconnects are analyzed and compared with that of neutral TC-MLGNRs as well as traditional copper (Cu) interconnects. Our analysis shows that for similar dimensions, As F5-intercalated TC-MLGNR interconnects can provide better performance than Cu wires for both local/intermediate and global interconnect applications. For 1 mm interconnect length, As F5-intercalated TC-MLGNRs offer significant improvement in delay, energy budget and BWD as compared to Cu wires for local/intermediate and global interconnects, thereby making it a promising candidate for future interconnect technologies.