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Beam Profile And Position Instability Of A Post-Accelerated Pseudospark-Sourced Electron Beam For An Extended Interaction Oscillator

机译:梁轮廓和延伸相互作用振荡器的加速后伪气柱源电子束的位置不稳定性

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The pseudospark discharge is a low-pressure gas discharge, that can generate extremely high currents within short rise times using a special hollow cathode structure. The highquality electron beam has high current density and brightness and the ability to self-focus via ion channel focusing. Simulations have shown the pseudospark-sourced electron beam can propagate within background plasma of density 1014-1016 m-3 with no applied guiding magnetic field, making it excellent for millimeter-wave generation. Single-shot electron beam pulses were imaged by a CCD camera measuring light emitted by electron beam impact on a 50 μm thickness stopping copper foil and phosphor screen. The high energy component beam profile has a Lorentzian distribution much smaller than the axial aperture size. A W-band (75-110 GHz) Extended Interaction Oscillator (EIO) millimeter-wave source was designed and constructed to operate in the 2π mode. With a 35 kV discharge voltage, the EIO successfully produced W-band radiation pulses of 200W peak power and 20ns pulse duration, agreeing with 3D Particle-in-Cell (PIC) MAGIC simulations. Simulations show the capability to extend this concept to higher frequencies.
机译:伪气柱排出是低压气体放电,其可以使用特殊的空心阴极结构在短的上升时间内产生极高的电流。高质量电子束具有高电流密度和亮度,并且通过离子通道聚焦自拍的能力。模拟已经示出了伪气柱 - 源电子束可以在密度10的背景等离子体中传播 14 -10 16 m -3 没有施加的导向磁场,使其优异地用于毫米波产生。通过电子束撞击的CCD相机测量光对单射电子束脉冲对50μm厚度停止铜箔和荧光屏进行成像。高能量分量梁轮廓具有远小于轴向孔径的洛伦兹分布。设计并构造了W频段(75-110GHz)扩展相互作用振荡器(EIO)毫米波源以在2π模式下操作。具有35 kV放电电压,EIO成功地产生了200W峰值功率和20ns脉冲持续时间的W波段辐射脉冲,同意3D粒子内(PIC)魔法模拟。模拟显示将该概念扩展到更高频率的能力。

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