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Effect of electron kinetics on global simulations for inductively coupled plasma sources

机译:电子动力学对电感耦合等离子体源的全局模拟的影响

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Summary form only given. Electron energy probability functions and electron heating mechanism strongly affect plasma parameters such as the electron temperature and plasma density in high density plasma sources. In order to analyze the effect, we developed a self-consistent global simulator for inductively coupled plasma sources. To obtain EEPF theoretically, we numerically solve the Fokker-Planck equation which couple the global transport model in a self-consistent manner. Absorbed power by electrons and the energy diffusion coefficient are determined by an analytic electron heating theory including the anomalous skin effect. The simulation results are then compared with experimental measurements such as the plasma density, electron temperature, and EEPF on external controllable parameters such as power and pressure. In particular, results show that the electron heating model should be combined for the global transport model to obtain the accurate electron temperature at pulsed plasma conditions.
机译:摘要表格仅给出。电子能量概率功能和电子加热机构强烈影响等离子体参数,例如高密度等离子体源中的电子温度和等离子体密度。为了分析效果,我们开发了一种用于电感耦合等离子体源的自我一致的全局模拟器。为了理论上获得EEPF,我们在数值上解决了Fokker-Planck等式,这些方程以自我支撑的方式耦合全局传输模型。通过电子吸收功率和能量扩散系数由包括异常皮肤效应的分析电子加热理论确定。然后将模拟结果与等离子体密度,电子温度和EEPF等实验测量进行比较,例如电力和压力等等离子体密度,电子温度和EEPF。特别地,结果表明,电子加热模型应该组合用于全局传输模型,以获得脉冲等离子体条件下的精确电子温度。

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