INDUCTIVELY COUPLED PLASMA SOURCE AND INDUCTIVELY COUPLED PLASMA PROCESSING APPARATUS USING SAME

摘要

Disclosed are an inductively coupled plasma source capable of generating uniform impedance on antennas, and an inductively coupled plasma processing apparatus using the same. The inductively coupled plasma source according to the present invention comprises a plurality of antennas; a plurality of transfer lines of the same length, which are connected to the respective antennas on one end thereof such that high frequency voltages are separately delivered to the antennas; and a transfer plate, to which the high frequency voltage is applied and the other end of each of the transfer lines is connected, and which delivers the high frequency voltage to the transfer lines such that uniform impedance is formed on the antennas.;COPYRIGHT KIPO 2014