首页> 外文会议>ASME international technical conference and exhibition on packaging and integration of electronic and photonic microsystems >MEASUREMENT OF MICROPROCESSOR DIE STRESS DUE TO THERMAL CYCLING, POWER CYCLING, AND SECOND LEVEL ASSEMBLY
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MEASUREMENT OF MICROPROCESSOR DIE STRESS DUE TO THERMAL CYCLING, POWER CYCLING, AND SECOND LEVEL ASSEMBLY

机译:由于热循环,功率循环和第二级装配而产生的微处理机模具应力的测量

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In the current work, we have extended our past studies on Flip Chip Ceramic Ball Grid Array (FC-BGA) microprocessor packaging configurations to investigate in-situ die stress variation during thermal and power cycling. The utilized (111) silicon sensor rosettes were able to measure the complete three-dimensional stress state (all 6 stress components) at each sensor site being monitored by the data acquisition hardware. The test chips had dimensions of 20 × 20 mm, and 3600 lead free solder interconnects (full area array) were used to connect the chips to high CTE ceramic chip carriers. A unique package carrier was developed to allow measurement of the die stresses in the FC-CBGA components under thermal and power cycling loads without inducing any additional mechanical loadings. Initial experiments consisted of measuring the die stress levels while the components were subjected to a slow (quasi-static) temperature changes from 0 to 100 C. In later testing, long term thermal cycling of selected parts was performed from 0 to 100 C (40 minute cycle, 10 minute ramps and dwells). After various durations of cycling, the sensor resistances at critical locations on the die device surface (e.g. die center and die corners) were recorded. From the resistance data, the stresses at each site were calculated and plotted versus time. Finally, thermal and power cycling of selected parts was performed, and in-situ measurements of the transient die stress variations were performed. Power cycling was implemented by exciting the on-chip heaters on the test chips with various power levels. During the thermal/power cycling, sensor resistances at critical locations on the die device surface (e.g. die center and die corners) were recorded continuously. From the resistance data, the stresses at each site were calculated and plotted versus time.
机译:在当前的工作中,我们扩展了过去对倒装芯片陶瓷球栅阵列(FC-BGA)微处理器封装配置的研究,以研究热和功率循环过程中原位芯片应力的变化。所利用的(111)硅传感器花环能够在由数据采集硬件监视的每个传感器位置上测量完整的三维应力状态(所有6个应力分量)。测试芯片的尺寸为20×20 mm,并使用3600个无铅焊料互连(全面积阵列)将芯片连接到高CTE陶瓷芯片载体。开发了一种独特的封装载体,可以在热和功率循环负载下测量FC-CBGA组件中的芯片应力,而不会引起任何其他机械负载。最初的实验包括在组件经受从0到100 C的缓慢(准静态)温度变化时测量模具应力水平。在以后的测试中,所选零件的长期热循环从0到100 C进行(40分钟周期,10分钟的斜坡和停留时间)。在循环的各种时间之后,记录在管芯器件表面上的关键位置(例如,管芯中心和管芯角)的传感器电阻。从电阻数据中,计算出每个部位的应力,并将其与时间作图。最后,执行选定零件的热循环和功率循环,并对瞬态冲模应力变化进行原位测量。通过以各种功率水平激励测试芯片上的片上加热器来实现功率循环。在热/功率循环期间,连续记录芯片设备表面上关键位置(例如芯片中心和芯片角)的传感器电阻。根据电阻数据,计算每个部位的应力,并将其绘制成时间曲线。

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