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Preparation and characterization of Cu2ZnGeS4 thin films by sulfurizing reactively sputtered precursors

机译:硫化反应溅射前驱体制备Cu 2 ZnGeS 4 薄膜及其表征

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CuZnGeS (CZGS) thin films were first grown by reactive magnetron co-sputtering technique and post sulfurization. Raman and X-ray diffraction (XRD) examination confirm the synthesized films to be tetragonal stannite CZGS together with ZnS secondary phase. The effect of two manufacturing conditions was investigated: sputtering pressure for precursor deposition and sulfurization temperature. By decreasing the sputtering pressure, the CZGS grain size in the sulfurized films is found to be increased. By increasing the sulfurization temperature, the CZGS grain size is also increased. However, serious voids and pinholes are found in the sample undergoing high sulfurization temperature. The formation of voids and pinholes can be explained by Ge loss via Ge sulfides sublimation. Besides, the M0S2 layer thickness is found dramatically increased after high-temperature sulfurization process.
机译:CuZnGeS(CZGS)薄膜首先通过反应磁控共溅射技术生长,然后进行硫化。拉曼和X射线衍射(XRD)检查确认合成的薄膜为四方锡矿CZGS以及ZnS次级相。研究了两种制造条件的影响:用于前驱物沉积的溅射压力和硫化温度。通过降低溅射压力,发现硫化膜中的CZGS晶粒尺寸增加。通过提高硫化温度,CZGS晶粒尺寸也增加了。然而,在经受高硫化温度的样品中发现严重的空隙和针孔。空隙和针孔的形成可以通过通过硫化锗升华引起的锗损失来解释。此外,在高温硫化过程后,发现M0S2层的厚度急剧增加。

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