Nanostructured system SiO_2/Si by ArF Excimer Laser Irradiation

摘要

In this work, the formation of micro-and nanoscale periodic structures on the surface of system SiO_2/Si by nanosecond laser pulses has been investigated. Under irradiation of experimental samples with ultraviolet ArF laser pulse (193 nm) were obtained periodic wave-like structures on the surface. The dependence of the surface topology of system SiO_2/Si on the energy density of the laser pulse and the number of pulses has been studied.