Structural properties of nanorod zinc oxide thin films on Si substrate deposited by RF magnetron sputtering at room temperature

摘要

Nanorod zinc oxide (ZnO) thin films have been successfully deposited using RF magnetron sputtering at room temperature. The RF power was varied and the effect on the surface characteristic of ZnO thin film was studied. The surface topography and morphology of the thin films were characterised using X-ray Diffractometer (XRD), Atomic Force Microscopy (AFM) and Field Emission Scanning Electron Microscopy (FESEM). The paper reveals the effect of RF power on the surface characteristic of ZnO thin film. The films deposited at a RF power of 250 W exhibited the best structural properties with good surface morphology.