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GaN based Junctionless Double Surrounding Gate (JLDSG) MOSFET for high power, high voltage and high frequency applications

机译:用于高功率,高压和高频应用的GaN基连接双围门(JLDSG)MOSFET

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In this paper GaN based JLDSG MOSFET has been analyzed for the time for different channel lengths (L = 18 nm, 24 nm, 30 nm) for its high power (HP), high voltage (HV) and high frequency operation. The performance of JLDSG MOSFET has been compared with conventional Junctionless Surrounding Gate (JLSG) MOSFET. It is found that JLDSG MOSFET poses high drain current, transconductance, Subthreshold Slope, Transconductance Generation Factor (TGF), cut off frequency (fT), Maximum Transducer Power Gain (MTPG) and Unilateral Power Gain (UPG).
机译:在本文的基于GaN的JLDSG MOSFET中,对于其高功率(HP),高压(HV)和高频操作,已经分析了不同通道长度(L = 18nm,24nm,30nm)的时间。将JLDSG MOSFET的性能与传统的无连接周围栅极(JLSG)MOSFET进行了比较。发现JLDSG MOSFET造成高漏极电流,跨导,亚阈值斜坡,跨导生成因子(TGF),切断频率(FT),最大换能器功率增益(MTPG)和单侧功率增益(UPG)。

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