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GaN based Junctionless Double Surrounding Gate (JLDSG) MOSFET for high power, high voltage and high frequency applications

机译:基于GaN的无结双环绕栅极(JLDSG)MOSFET,适用于高功率,高电压和高频应用

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In this paper GaN based JLDSG MOSFET has been analyzed for the time for different channel lengths (L = 18 nm, 24 nm, 30 nm) for its high power (HP), high voltage (HV) and high frequency operation. The performance of JLDSG MOSFET has been compared with conventional Junctionless Surrounding Gate (JLSG) MOSFET. It is found that JLDSG MOSFET poses high drain current, transconductance, Subthreshold Slope, Transconductance Generation Factor (TGF), cut off frequency (fT), Maximum Transducer Power Gain (MTPG) and Unilateral Power Gain (UPG).
机译:本文分析了基于GaN的JLDSG MOSFET的时间,分析了其高功率(HP),高电压(HV)和高频工作情况下不同沟道长度(L = 18 nm,24 nm,30 nm)的时间。 JLDSG MOSFET的性能已与传统的无结环绕栅极(JLSG)MOSFET进行了比较。发现JLDSG MOSFET具有高漏极电流,跨导,亚阈值斜率,跨导生成因子(TGF),截止频率(fT),最大传感器功率增益(MTPG)和单边功率增益(UPG)。

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