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Dielectric property of lead titanate thin films prepared on glass substrate at low temperature

机译:低温玻璃基材上制备铅钛酸薄膜的介电性能

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Lead based titanate (PbTiO3) is one of ferroelectric ceramic family that has been widely investigated of its dielectric property towards high capacitance passive device, i.e. capacitor. It has been known that high annealing temperature is needed to perform perfect crystal level of ferroelectric ceramic that is averagely 650°C done by using crystalline Si substrate with Pt/Ti as intermediate layer. This had been confirmed as the ideal process to have perfectly distribution of uniform grain size with tendency of stable dipole moment. However, high temperature does affect the nucleation site of domain wall where here lays the factor contributes to Pb volatilization and yields to thin films degradation. Further investigation of PbTiO3 thin films preparation at relatively lower temperature was at least 200°C could be the most desirable thin films ever to answer the limitation of source. Therefore, these temperatures make deposition of PbTiO3 possible for glass substrate which has low melting temperature. The current study investigates preparation of PbTiO3 thin films on platinum coated glass substrate through sol-gel spin coating method. The optimum thickness of thin films was achieved by five times of depositions and punctuated with drying process about 200°C for 10mins for each layer. Annealing process was carried out in hot furnace at temperature 300°C to 500°C for 30mins. The prepared thin films were then being measured by impedance analyzer under low frequency about 1000Hz for the dielectric property investigation. It was found that the dielectric constant have linear relationship with annealing temperature. Nevertheless, high dielectric constant resulted to the factor of high dielectric loss that plays a role as in AC signal. In addition, the capacitance value of PbTiO3 thin films is being obtained under low frequency of dielectric constant measurement. Concisely, both d- electric constant and nanometer scaled thin films had influenced much to the capability for high energy storage which will be discussed later in future investigation.
机译:基于钛酸钛(PBTIO3)是铁电陶瓷家族之一,已被广泛研究其朝向高电容无源装置的电介质性能,即电容器。已经知道,需要高退火温度来执行通过使用具有Pt / Ti作为中间层的结晶Si衬底来完成的铁电陶瓷的完美晶体水平,其平均为650℃。这已被证实是具有完全分布均匀粒度的理想过程,具有稳定的偶极矩的趋势。然而,高温确实会影响结构域壁的成核位点,其中占据了Pb挥发的因子,并产生薄膜降解。进一步研究PBTIO3薄膜在相对较低的温度下制备至少200℃可以是有史以来最理想的薄膜以回答源极的限制。因此,这些温度使得熔融温度低的玻璃基板沉积PBTIO3。目前的研究通过溶胶 - 凝胶旋涂法调查铂涂覆玻璃基板上的PBTIO3薄膜的制备。薄膜的最佳厚度通过五次沉积而达到,并用干燥过程喷出约200℃,每层10分钟。退火过程在热炉中在温度300℃至500℃下进行30分钟。然后通过阻抗分析仪在低频约1000Hz下测量制备的薄膜,用于介电性能研究。发现介电常数具有与退火温度的线性关系。然而,高介电常数导致高介电损耗的因子,其在AC信号中起作用。另外,在低频的介电常数测量的低频下获得PBTIO3薄膜的电容值。简洁地,D-电常数和纳米缩放的薄膜对高能量储存的能力影响了很大影响,这将在未来的调查中稍后讨论。

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