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Effect of channel width-to-length ratio on isothermal point of MOSFET-ISFET structure

机译:沟道长宽比对MOSFET-ISFET结构等温点的影响

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The effect of channel width-to-length (W/L) ratio on MOSFET-ISFET structures was investigated from simulation and experimental approach. A metal-oxide-semiconductor field-effect-transistor (MOSFET) has been adopted to investigate the isothermal point of an ion-sensitive FET (ISFET), which is needed to suit the readout interfacing circuit of an ISFET sensor. The MOSFET structure with different W/L ratio has been characterized in order to see the effect of W/L ratio to the isothermal point. The Keithley 236 Parameter Analyzer and Semi-auto prober micromanipulator system were used to measure the drain-source current (IDS) versus gate to source voltage (VGS) curves at various temperatures from 30 °C to 60 °C. The simulation result showed that the reduction of W/L ratio can decrease the isothermal point and this was proven by the actual measurement.
机译:通过仿真和实验方法研究了沟道宽长(W / L)比对MOSFET-ISFET结构的影响。已采用金属氧化物半导体场效应晶体管(MOSFET)来研究离子敏感FET(ISFET)的等温点,以适应ISFET传感器的读出接口电路。为了观察W / L比对等温点的影响,对具有不同W / L比的MOSFET结构进行了表征。吉时利236参数分析仪和半自动探针微操纵器系统用于在30°C至60°C的各种温度下测量漏极-源极电流(IDS)与栅极到源极电压(VGS)的关系曲线。仿真结果表明,降低W / L比可以降低等温点,实际测量结果证明了这一点。

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