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A bulk micromachined silicon neural probe with nanoporous platinum electrode for low impedance recording

机译:具有纳米孔铂电极的块状微机械硅神经探针,用于低阻抗记录

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In this research, a bulk micromachined silicon neural probe with electroplated nanoporous Pt (NPt) electrodes was newly designed, fabricated, and characterized to reduce the interfacial impedance of microelectrodes which are highly desirable for neural signal recording and stimulation. One of the most important requirements in the electro-chemical neural probes is to reduce the interfacial impedance of microelectrodes, because the neural signals usually have very small amplitude and the increased impedance can cause the charge transfer capability of microelectrodes to decrease. The highly roughened NPt film was electroplated on top of circular shaped gold electrode (Diameter: 2 μm) formed on the tip of silicon neural probe. The roughen NPt surface could dramatically reduce the interface impedance of microelectrodes of neural probe. The fabricated neural probe exhibited extremely low impedance of 0.029 Ωcm2 and specific capacitance of 4.6 mFcm−2 at 1.2 kHz, respectively.
机译:在这项研究中,新设计,制造并装配了带有电镀纳米多孔Pt(NPt)电极的体微机械硅神经探针,以降低微电极的界面阻抗,这对于神经信号记录和刺激是非常需要的。电化学神经探针中最重要的要求之一是降低微电极的界面阻抗,因为神经信号通常具有非常小的振幅,并且增加的阻抗会导致微电极的电荷转移能力降低。将高度粗糙的NPt膜电镀在硅神经探针尖端上形成的圆形金电极(直径:2μm)的顶部。粗糙的NPt表面可显着降低神经探针微电极的界面阻抗。制成的神经探针在1.2 kHz时分别具有0.029Ωcm 2 的极低阻抗和4.6 mFcm -2 的比电容。

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