Extending Technology Roadmap by Selective Device Footprint Scaling and Parasitics Engineering

摘要

We propose a path for extending the technology roadmap when currently considered technology boosters (e.g., strain, high-k/metal gate) reach their limits. By carefully engineering the device parasitic resistance and parasitic capacitance, and considering the impact of the interconnect wiring capacitance, we propose scenarios of device footprint and device structure scaling that will enable technology scaling for several generations beyond the currently perceived limits.