首页> 外文会议>ASME summer heat transfer conference >2-D SIMULATION OF HOT ELECTRON-PHONON INTERACTIONS IN A SUBMICRON GALLIUM NITRIDE DEVICE USING HYDRODYNAMIC TRANSPORT APPROACH
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2-D SIMULATION OF HOT ELECTRON-PHONON INTERACTIONS IN A SUBMICRON GALLIUM NITRIDE DEVICE USING HYDRODYNAMIC TRANSPORT APPROACH

机译:流体动力学方法在亚微米氮化镓装置中电子-声子相互作用的二维模拟

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In this study, a thermal and electrical coupled device solver is developed to simulate the energy transfer mechanism within a GaN FET with a gate length of 0.2 μm. The simulation simultaneously solves a set of hydrodynamic equations (derived from the Boltzmann Transport Equation) and the Poisson equation for electron, optical phonon and acoustic phonon energies, electron number density, electric field and electric potential. This approach has been previously established for gallium arsenide (GaAs) devices [36,37], but has not been extended to GaN due to the lack of readily available property values for GaN devices that are required. Via extensive literature study, high-fidelity properties for GaN were collected in analytical forms with respect to many dependencies, e.g. lattice temperature, electrical field, electron number density, doping rate, defects rate. These properties are then implemented into the developed code to provide a high accuracy sub-micron GaN device simulation.Simulations show that non-equilibrium heat generation is exhibited in a typical device while the drain current is reduced due to the decrease in electron mobility. Future analysis is needed to quantify the hot-electron effect on reducing the drain current and to discover more effective ways of heat removal.
机译:在这项研究中,开发了一种热电耦合器件求解器,以模拟栅极长度为0.2μm的GaN FET中的能量传输机制。该模拟同时求解了一组流体动力学方程(从玻耳兹曼输运方程派生)和泊松方程,分别用于电子,光子和声子能量,电子数密度,电场和电势。这种方法先前已经为砷化镓(GaAs)器件建立了[36,37],但由于缺少所需的GaN器件容易获得的性能值,因此尚未扩展到GaN。通过广泛的文献研究,以分析形式收集了GaN的高保真特性,涉及许多依赖性,例如晶格温度,电场,电子数密度,掺杂率,缺陷率。然后将这些特性实现为已开发的代码,以提供高精度的亚微米GaN器件仿真。仿真表明,典型器件中会出现非平衡生热,而由于电子迁移率的降低会降低漏极电流。需要进行进一步的分析,以量化热电子对降低漏极电流的影响,并发现更有效的散热方式。

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