首页> 外文会议>International conference on biotechnology, chemical and materials engineering >Ab initio investigation of the influence of single intrinsic defect on the structure, bulk moduli and electronic properties of Ⅴ-doped ZnO
【24h】

Ab initio investigation of the influence of single intrinsic defect on the structure, bulk moduli and electronic properties of Ⅴ-doped ZnO

机译:从头开始研究单个内在缺陷对Ⅴ型掺杂ZnO的结构,体积模量和电子性能的影响

获取原文

摘要

We researched the effect of single intrinsic defect of the structure and electronic properties of Ⅴ-doped ZnO.After vanadium (Ⅴ) atom replaced one zinc atom,lattice constants and bulk modulus increased slightly 1.2% and as high as 8.9%,respectively.The total energy showed that oxygen defect inclined to stay at a position far from Ⅴ atom but zinc defect likely to localize at a position near Ⅴ atom.The electronic density state of pure ZnO was semiconductor behavior.Vanadium doping introduced a spin-polarization around Fermi-level.The 3d orbital of Ⅴ split into triplet-state ta (antibonding state),dual-state e (nonbonding state) and triplet-state tb (bonding state) in the wurtzite ZnO crystal field.The ta state hybridized with O2p state above Fermi-level,which made Znl5VOl6 underwent a semiconductor-halfmetal transition.Vanadium substitution moved the electronic density states to lower energy.Oxygen defect had little effects on Ⅴ-doped ZnO while zinc defect moved the density of states to higher energy.Our paper provided a reference for the preparation and application of Ⅴ-doped ZnO.
机译:我们研究了单一的固有缺陷对Ⅴ掺杂的ZnO的结构和电子性能的影响。钒(Ⅴ)原子取代一个锌原子后,晶格常数和体积模量分别略微增加了1.2%和高达8.9%。总能量表明,氧缺陷倾向于保持在远离Ⅴ原子的位置,而锌缺陷则可能位于靠近Ⅴ原子的位置。纯ZnO的电子密度状态是半导体行为。钒掺杂在费米原子周围引入了自旋极化。纤锌矿型ZnO晶体场中Ⅴ的3d轨道分裂成三重态ta(反键态),双态e(非键态)和三重态tb(键态).ta态与上面的O2p态杂化费米能级使Znl5VOl6经历了半导体-半金属的转变。钒取代将电子密度态降低到较低的能量。氧缺陷对Ⅴ掺杂的ZnO的影响很小,而锌缺陷将态密度提高到5%。本文为钒掺杂ZnO的制备和应用提供了参考。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号