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First-principles calculations of electronic structure and optical properties of Boron-doped ZnO with intrinsic defects

机译:含固有缺陷的掺硼ZnO的电子结构和光学性质的第一性原理计算

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This study adopted first-principles calculations to evaluate the effects of intrinsic defects on the electronic structure and optical properties of Boron-doped ZnO (BZO). Four types of defect were considered: non-defective (B_(Zn)), Zn vacancies (V_(Zn)), O vacancies (V_O), and interstitial Zn (Zn_i). Calculations of formation energy illustrate that O-rich conditions tend to induce V_(Zn), while O-poor conditions tend to induce V_O and Zn_i. With respect to electric properties, V_(Zn) defects in BZO decrease carrier concentration as well as mobility, which consequently decreases the conductivity of BZO. The existence of V_O or Zn_i defects in BZO leads to n-type conductive characteristics and increases the optical band gap. The existence of Zn_i defects in BZO also increases the effective mass, which decreases the mobility and conductivity of BZO. As for the optical properties, the introduction of V_(Zn) to BZO leads to an increase in transmittance in the visible light region, but a decrease in the UV region. The introduction of intrinsic V_O and Zn_i defects to BZO leads to a significant decrease in transmittance in the visible as well as UV regions. The calculated results were also compared with experimental data from the literature.
机译:这项研究采用第一性原理计算来评估固有缺陷对掺硼ZnO(BZO)的电子结构和光学性能的影响。考虑了四种类型的缺陷:无缺陷(B_(Zn)),锌空位(V_(Zn)),O空位(V_O)和间隙锌(Zn_i)。地层能量的计算表明,富氧条件趋于诱发V_(Zn),而贫氧条件趋于诱发V_O和Zn_i。在电性能方面,BZO中的V_(Zn)缺陷会降低载流子浓度和迁移率,因此会降低BZO的电导率。 BZO中V_O或Zn_i缺陷的存在导致n型导电特性并增加了光学带隙。 BZO中Zn_i缺陷的存在也增加了有效质量,从而降低了BZO的迁移率和电导率。关于光学性质,将V_(Zn)引入BZO导致在可见光区域的透射率增加,但是在UV区域的透射率减少。将固有的V_O和Zn_i缺陷引入BZO会导致可见光区域和UV区域的透射率显着降低。还将计算结果与文献中的实验数据进行了比较。

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