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Sub-30nm scaling and high-speed operation of fully-confined Access-Devices for 3D crosspoint memory based on mixed-ionic-electronic-conduction (MIEC) materials

机译:基于混合离子电子导电(MIEC)材料的3D交叉点存储器的全封闭存取设备的30nm以下缩放和高速操作

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摘要

BEOL-friendly Access Devices (AD) based on Cu-containing MIEC materials [1–3] are shown to scale to the <30nm CDs and <12nm thicknesses found in advanced technology nodes. Switching speeds at the high (>100uA) currents of NVM writes can reach 15ns; NVM reads at typical (∼5uA) current levels can be ≪1usec.
机译:基于含铜MIEC材料[1-3]的BEOL友好型访问设备(AD)的显示尺寸可扩展至先进技术节点中的<30nm CD和<12nm厚度。 NVM写入的高电流(> 100uA)时的开关速度可以达到15ns;在典型电流(〜5uA)时,NVM读数约为use1usec。

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