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Sub-30nm scaling and high-speed operation of fully-confined Access-Devices for 3D crosspoint memory based on mixed-ionic-electronic-conduction (MIEC) materials

机译:基于混合离子电子传导(MIEC)材料的3D交叉点存储器的完全限制接入装置的SUB-30NM缩放和高速操作

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摘要

BEOL-friendly Access Devices (AD) based on Cu-containing MIEC materials [1–3] are shown to scale to the <30nm CDs and <12nm thicknesses found in advanced technology nodes. Switching speeds at the high (>100uA) currents of NVM writes can reach 15ns; NVM reads at typical (∼5uA) current levels can be ≪1usec.
机译:基于Cu的MIEC材料[1-3]的BEOL友好的接入设备(AD)被示出为划分为&#x003c; 30nm cds和&#x003c;在高级技术节点中找到12nm厚度。 NVM写入的高(&#x003e; 100ua)电流的切换速度可以达到15ns; NVM在典型的(&#x223c; 5ua)电流水平上读取可以是&#x226a; 1usec。

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