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Nanoalloyed Bi_2Te_3, Sb_2Te_3 and Bi_2Tei/Sb_2Te_3 Multilayers

机译:nano alloyed BI_2TE_3, SB_2TE_3 and BI_2T诶/SB_2TE_3 multilayer是

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In this work, thin films of Bi_2Te_3 and Sb_2Te_3 were synthesized by the nanoalloying approach: Nanoscale layers of the elements Element nanoscale layers of Bi, Sb and Te are stoichiometrically deposited on a cold substrate using a MBE setup and subjected to an annealing process in which a solid state reaction yielding Bi_2Te_3 and Sb_2Te_3 takes place. Besides the two binary compounds, nanoscale multilayer (ML) stacks of 9 nm Bi_2Te_3/9 nm Sb_2Te_3 were created. The electrical transport properties of the binary compounds were determined in dependence of composition. Compound formation was directly observed in temperature-dependent in-situ XRD scans and was found to start at ~100 °C. The stability of the Bi_2Te_3/Sb_2Te_3 ML nanostructure against temperature-driven interdiffusion during annealing was examined by SIMS and TEM for an annealing temperature of 150 and 250 °C, respectively. A comparative TEM study of the as grown and annealed state is presented.
机译:在这项工作中,通过纳米合金化方法合成了Bi_2Te_3和Sb_2Te_3薄膜:元素的纳米级层使用MBE装置化学计量地将Bi,Sb和Te的元素纳米级层沉积在冷基板上,并进行退火处理,其中发生固态反应,生成Bi_2Te_3和Sb_2Te_3。除了这两种二元化合物,还创建了9 nm Bi_2Te_3 / 9 nm Sb_2Te_3的纳米级多层(ML)堆栈。根据组成确定二元化合物的电传输性质。在温度相关的原位XRD扫描中直接观察到了化合物的形成,发现该化合物的形成始于〜100°C。通过SIMS和TEM分别研究了退火温度为150和250°C时Bi_2Te_3 / Sb_2Te_3 ML纳米结构在温度驱动的相互扩散过程中的稳定性。呈现了对生长和退火状态的比较TEM研究。

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