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Morphology and Magneto-optical Properties of Amorphous A1N Films Doped with Nickel

机译:掺镍非晶A1N薄膜的形貌和磁光特性

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Structural and magneto-optical properties of Ni-doped amorphous A1N layers (a-AIN) deposited by radio frequency (rf) sputtering on Silicon (001) substrates were investigated. The as-grown material exhibits weak ferromagnetic behavior as evidenced by the magneto-optic Kerr effect (MOKE) measurement with Kerr rotation less than 100 urad at room temperature regardless of the Ni fraction. The samples with a Ni concentration below 10 at.% show a weak but monotonically increasing MOKE signal with post-growth annealing temperature. A hundred-fold increase in the Kerr rotation value was observed for samples with Ni content exceeding 20 at.% after thermal annealing at 450°C in nitrogen; and the Ken-rotation value abruptly decreases above that temperature. The morphology of as-grown and annealed a-AlN:Ni films were characterized by small angle x-ray scattering and transmission electron microscopy. It was found that the as-deposited film contains nano-particles of different sizes with average diameters less than 30 nm. The size distribution of nano-particles in the thermally annealed a-AlN:Ni was studied as a function of annealing time and temperature. The results correlate well with those obtained from the MOKE measurements.
机译:研究了通过射频(rf)溅射在硅(001)衬底上沉积的掺Ni非晶AlN层(a-AIN)的结构和磁光特性。所生长的材料表现出较弱的铁磁性能,这由磁光克尔效应(MOKE)测量证明,室温下Kerr旋转小于100 urad而不管Ni含量如何。 Ni浓度低于10 at。%的样品随生长后退火温度显示出微弱但单调增加的MOKE信号。在氮气中于450°C进行热退火后,Ni含量超过20 at。%的样品的Kerr旋转值增加了100倍; Ken旋转值在该温度以上突然降低。通过小角度X射线散射和透射电子显微镜表征了生长和退火后的a-AlN:Ni薄膜的形貌。发现所沉积的膜包含平均直径小于30nm的不同尺寸的纳米颗粒。研究了退火后的a-AlN:Ni中纳米粒子的尺寸分布与退火时间和温度的关系。结果与从MOKE测量获得的结果非常相关。

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